The results show that threeelectrode DC ladle furnace, increasing heating speed and without arc bias, can overcome the shortcomings of bottom-electrode DC ladle furnace.
试验表明，三电极直流钢包炉技术可解决底电极式直流钢包炉存在的不足，使炉子加热速度快和不发生偏弧现象。
Tetrahedral amorphous carbon (ta-C) films have been deposited on P-type (100) polished c-silicon wafer with different substrate negative bias by filtered cathodic vacuum arc technology.
采用过滤阴极真空电弧技术并施加一定的衬底负偏压，在P（100）单晶硅片上制备出四面体非晶碳薄膜。
The influencing factors and their weights on deposited temperature have been studied in detail during pulsed bias arc ion plating (PBAIP).
针对脉冲偏压电弧离子镀技术，分析了影响基体沉积温度的各项因素及其影响程度。
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